標(biāo)準(zhǔn)號(hào)：BS EN 62226-3-1-2007
中文標(biāo)準(zhǔn)名稱：暴露于低頻和中頻電場(chǎng)或磁場(chǎng).人體內(nèi)電流密度和感應(yīng)內(nèi)電場(chǎng)的計(jì)算方法.暴露于磁場(chǎng).分析和二維數(shù)字模型
英文標(biāo)準(zhǔn)名稱：Exposure to electric or magnetic fields in the low and intermediate frequency range - Methods for calculating the current density and internal electric field induced in the human body - Exposure to electric fields - Analytical and 2D numerical models
標(biāo)準(zhǔn)類型：A58
發(fā)布日期：2007/10/31 12:00:00
實(shí)施日期：2007/10/31 12:00:00
中國(guó)標(biāo)準(zhǔn)分類號(hào)：A58
國(guó)際標(biāo)準(zhǔn)分類號(hào)：17.240
適用范圍：This part of IEC 62226 applies to the frequency range for which exposure limits are based onthe induction of voltages or currents in the human body when exposed to electric fields.This part defines in detail the coupling factor K – introduced by the IEC 62226 series toenable exposure assessment for complex exposure situations, such as non-uniform magneticfield or perturbed electric field – for the case of simple models of the human body, exposed touniform electric fields. The coupling factor K has different physical interpretations dependingon whether it relates to electric or magnetic field exposure. It is the so called “shape factor forelectric field”.This part of IEC 62226 can be used when the electric field can be considered to be uniform,for frequencies up to at least 100 kHz.This situation of exposure to a “uniform” electric field is mostly found in the vicinity of highvoltage overhead power systems. For this reason, illustrations given in this part are given forpower frequencies (50 Hz and 60 Hz).