標準號：ISO 16531-2013
中文標準名稱：表面化學分析.深度剖析.原子發(fā)射光譜(AES)和光電子能譜(XPS)中深度剖析用電流或電流密度的離子束校正和相關測量方法
英文標準名稱：Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
標準類型：G04
發(fā)布日期：2013/6/1 12:00:00
實施日期：1999/12/31 12:00:00
中國標準分類號：G04
國際標準分類號：71.040.40
引用標準：ISO 18115-1
適用范圍：This International Standard specifies methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using inert gas ions in Auger electron spectroscopy and X-ray photoelectron spectroscopy. These methods are of two types: one involves a Faraday cup to measure the ion current; the other involves imaging methods. The Faraday cup method also specifies the measurements of current density and current distributions in ion beams. The methods are applicable for ion guns with beams with a spot size below ~1 mm in diameter. The methods do not include depth resolution optimization.